Oxide and Nitride Thin Film Standards

The oxide and nitride thin film standard are offered over a wide range of nominal thicknesses. The precision SiO2 or Si3N4 design is suitable for all optical film thickness measurement tools. Special features on the thin film standard allow the user to align the vision system to the real measurement beam spot, set the best focus and stage height positions and determine the actual beam size of the instrument. All of these parameters contribute to signal quality and measurement results and should be checked on a regular basis.

Key Features:

Oxide and Nitride Thin Film Standards

Diagnostic Features for Beam Position, Beam Size, and F

Superior Film Quality and Uniformity

Pattern Recognition Alignment Marks

NIST traceable

Diagnostic features

More details could be found at PSI Standards' web site