MEMS Process Equipment

memsstar offers unique and patented processing systems enabling unrivalled process control and wide process windows for vapour phase isotropic etch and surface modification.
Sacrificial Vapour Release (SVR) modules utilise XeF2 and aHF gasses to meet your etch demands. Complimenting the SVR is the Surface Preparation and Depostion (SPD) for all your surface coating requirements. All the process modules are fully automated and computer controlled. Stand-alone process module are upgradable to single wafer vacuum laodlock and further to single wafer cluster tool.

Key Features:

Vapour phase processing

Single wafer processing with high etch rates

Excellent uniformity & repeatability

Class leading selectivity to underlayer and mechanical material

Stiction free

More details could be found at at memsstar's web site