Advanced Photo Resist Removal and Wet Cleaning

Very cost effective and environmentally friendly products for photo resist removal and wet cleaning processes through green technology. The patented ColdStrip™, OrganoStrip™ and Dryzone™ use ozonated chemical processing solutions. The technology has already received the Green Chemistry Challenge Award for hazardous waste reduction. It will dramatically reduce your production costs while increase the wafer throughput.

ColdStrip™ is a patented turnkey replacement for Sulfuric-Piranha solutions, Ashers and Solvent strippers. At low temperatures, the equipment generates high ozone concentrations from 75 ppm to more than 100 ppm. Users benefit from increase in throughput, lower inventory costs, sharply reduced chemical usage and significantly less environmental impact. Coldstrip™ eliminates the use of sulfuric acid, hydrogen peroxide, and the subsequent rinse associated with piranha solutions. ColdStrip™ is easily retrofitted into almost any existing processing station.

ReactiveZone™ and OrganoStrip™ use variations of the ColdStrip™ processing technology. ReactiveZone™ is optimized for heavy organic cleaning and heavy dose implanted resist removal. OrganoStrip™ is fully metal compatible including copper and delivers very high resist removal rates.

DryZone™ is a patented new solvent gradient dryer which leaves no detectable volatile organic carbon in the exhaust, and supports green chemistry initiatives, unlike isopropyl alcohol consuming dryers. DryZone™ uses only de-ionized water, ozone and minute amounts of carbon based solvents. Because the dryer uses reactive chemistries, it is more than just particle neutral, it is particle reducing.

More details could be found at Legacy Systems' web site